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for sensitive chromatographic and analytical workflows requiring minimal baseline interference.
Room temperature Ships Normal Check lot-specific COA for exact specifications.
SDS, COA, datasheet, and spec sheet available for download. Lot-specific COA accessible via lot number lookup.
Cited in 0 peer-reviewed publications across chromatography, organic synthesis, and cross-coupling reactions.
Description
CE-200 solution can be used to etch out the copper residue or foil from the chemical vapor deposited (CVD) graphene or carbonated films by immersing the substrate with the nanomaterial into the etchant solution for 30 min.It is ideal for spray etching of copper. Ferric chloride based Cu etchant with etch rate of 0.5 mil/min @ 40 °C.
Comprehensive hazard, handling, storage, and regulatory compliance document.
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| Lot Number | Certificate Type | Date | Item |
|---|---|---|---|
| Certificate of Analysis | Mar 03, 2026 | C487577 | |
| Certificate of Analysis | Mar 03, 2026 | C487577 | |
| Certificate of Analysis | Feb 05, 2026 | C487577 | |
| Certificate of Analysis | Oct 29, 2025 | C487577 | |
| Certificate of Analysis | May 12, 2025 | C487577 |
| Solubility | Soluble in water (20℃) |
|---|