≥99.5% metals basis for sensitive chromatographic and analytical workflows requiring minimal baseline interference.
Room temperature,Argon charged Ships Normal Check lot-specific COA for exact specifications.
SDS, COA, datasheet, and spec sheet available for download. Lot-specific COA accessible via lot number lookup.
Cited in 0 peer-reviewed publications across chromatography, organic synthesis, and cross-coupling reactions.
Product Application:
Copper silicide thin film is used for passivation of copper-based chips, where it serves to suppress diffusion and electromigration and serves as a diffusion barrier. It is involved in the direct process, the industrial route to organosilicon compounds.
| Pubchem Sid | 488195718 |
|---|---|
| Canonical Smiles | [Si].[Cu].[Cu].[Cu].[Cu].[Cu] |
| Isomeric SMILES | [Si].[Cu].[Cu].[Cu].[Cu].[Cu] |
| Molecular Weight | 345.815 |
| Reaxy-Rn | 16529988 |
| Reaxys-RN_link_address | https://www.reaxys.com/reaxys/secured/hopinto.do?context=S&query=IDE.XRN=16529988&ln= |
Comprehensive hazard, handling, storage, and regulatory compliance document.
Download SDS →Lot-specific quality data. Enter your lot number to retrieve the exact COA.
Look up COA →Full quality attributes and acceptance criteria for this grade.
View spec sheet →Find and download the COA for your product by matching the lot number on the packaging.
| Lot Number | Certificate Type | Date | Item |
|---|---|---|---|
 A2304053 | Certificate of Analysis | Oct 14, 2025 | C335850 |
| A2304051 | Certificate of Analysis | Oct 14, 2025 | C335850 |
| A2304435 | Certificate of Analysis | Oct 13, 2025 | C335850 |
| A2304438 | Certificate of Analysis | Oct 13, 2025 | C335850 |
| A2304439 | Certificate of Analysis | Oct 13, 2025 | C335850 |
| A2304440 | Certificate of Analysis | Oct 13, 2025 | C335850 |
| Solubility | Insoluble in water. |
|---|---|
| Sensitivity | Moisture sensitive. Air sensitive |
| Melt Point(°C) | 825° C |
