CVD & ALD Precursors

CVD & ALD precursors for thin-film deposition and semiconductor research. Browse metal-organic and inorganic precursors (where available) with key identifiers and handling guidance to support deposition process development.

Browse by type, application, or key specifications such as purity, grade, packaging, and handling requirements.

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  1. Iridium chloride
    CAS: 10025-83-9 EC Number: 233-044-6 PubChem CID: 25563 Formula: IrCl3 Molecular Weight: 298.56
    Solid crystalline ,Ir≥62.0%
    In Stock Item #: I123015
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    Technical Identifiers
    IUPAC Name
    trichloroiridium
    SMILES
    Cl[Ir](Cl)Cl
    InChIKey
    DANYXEHCMQHDNX-UHFFFAOYSA-K
    InChI
    1S/3ClH.Ir/h3*1H;/q;;;+3/p-3
    Synonyms
    DANYXEHCMQHDNX-UHFFFAOYSA-K | Iridium(III) chloride, anhydrous (99.95+%-Ir) | Trichloroiridium | UNII-20278OEG45 | DT...
  2. Zirconium(IV) t-butoxide
    CAS: 2081-12-1 Formula: C16H36O4Zr Molecular Weight: 383.68
    Liquid ≥97%
    Out of Stock Item #: Z282612
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    Technical Identifiers
    IUPAC Name
    2-methylpropan-2-ol;zirconium
    SMILES
    CC(C)(C)O.CC(C)(C)O.CC(C)(C)O.CC(C)(C)O.[Zr]
    InChIKey
    WRMYASGYMABHCC-UHFFFAOYSA-N
    InChI
    1S/4C4H10O.Zr/c4*1-4(2,3)5;/h4*5H,1-3H3;
    Synonyms
    zirconium(iv) t-butoxide | SCHEMBL108395 | Zirconium(IV) tert-butoxide, packaged for use in deposition systems | MFCD...
  3. Beryllium acetylacetonate
    CAS: 10210-64-7 EC Number: 233-513-5 Formula: C10H14BeO4 Molecular Weight: 207.23
    In Stock Item #: B107855
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    Technical Identifiers
    IUPAC Name
    beryllium;(Z)-4-oxopent-2-en-2-olate
    SMILES
    [Be+2].CC(=CC(=O)C)[O-].CC(=CC(=O)C)[O-]
    InChIKey
    BBKXDHBLPBKCFR-FDGPNNRMSA-L
    InChI
    1S/2C5H8O2.Be/c2*1-4(6)3-5(2)7;/h2*3,6H,1-2H3;/q;;+2/p-2/b2*4-3-;
    Synonyms
    EINECS 233-513-5 | SCHEMBL163499 | UNII-Z9095ZTD3U | Bis(pentane-2,4-dionato-O,O')beryllium | Beryllium, bis(2,4-pent...
  4. N,N''-Di-t-butyl-2,3-diamidobutanetin(II)
    CAS: 1268357-44-3 PubChem CID: 121235198 Formula: C12H26N2Sn Molecular Weight: 317.06
    ≥98% 50-1150, contained in 50 ml Swagelok® cylinder(96-1070) for CVD/ALD
    Out of Stock Item #: N283561
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    Technical Identifiers
    IUPAC Name
    1,3-ditert-butyl-1,3,2λ2-diazastannepane
    SMILES
    CC(C)(C)N1CCCCN([Sn]1)C(C)(C)C
    InChIKey
    OPXWRBRVIBWLSN-UHFFFAOYSA-N
    InChI
    1S/C12H26N2.Sn/c1-11(2,3)13-9-7-8-10-14-12(4,5)6;/h7-10H2,1-6H3;/q-2;+2
  5. Tetrakis(ethylmethylamino)hafnium
    CAS: 352535-01-4 PubChem CID: 4103752 Formula: C12H32HfN4
    <0.15% Zr TEMAH,72-7720, contained in 50 ml Swagelok® cylinder96-1070 for CVD/ALD
    Out of Stock Item #: T283559
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    Technical Identifiers
    IUPAC Name
    ethyl(methyl)azanide;hafnium(4+)
    SMILES
    CC[N-]C.CC[N-]C.CC[N-]C.CC[N-]C.[Hf+4]
    InChIKey
    NPEOKFBCHNGLJD-UHFFFAOYSA-N
    InChI
    1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
    Synonyms
    Tetrakis(ethylmethylamido)hafnium(IV), packaged for use in deposition systems | SCHEMBL237323 | Tetrakis(ethylmethyla...
  6. Ytterbium(III) hexafluoroacetylacetonate dihydrate
    CAS: 81849-60-7 EC Number: 815-366-4 Formula: C15H3F18O6Yb·2H2O Molecular Weight: 830.22
    Out of Stock Item #: Y283040
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    Technical Identifiers
    IUPAC Name
    1,1,1,5,5,5-hexafluoro-4-hydroxypent-3-en-2-one;ytterbium;dihydrate
    SMILES
    C(=C(C(F)(F)F)O)C(=O)C(F)(F)F.C(=C(C(F)(F)F)O)C(=O)C(F)(F)F.O.O.[Yb]
    InChIKey
    MHHPBTBQHUHFDW-UHFFFAOYSA-N
    InChI
    1S/2C5H2F6O2.2H2O.Yb/c2*6-4(7,8)2(12)1-3(13)5(9,10)11;;;/h2*1,12H;2*1H2;
    Synonyms
    Ytterbium Hexafluoropentanedionate dihydrate
  7. Bis(N,N-di-i-propylformamidinato)calcium(II) dimer,
    CAS: 1959584-78-1 Formula: C₂₈H₆0Ca₂N₈ Molecular Weight: 588.99
    PrimorTrace™ ? PrimorTrace™ — Aladdin's trace-metal-analysis line with ultra-low metal background. Use for ICP/AAS trace-metal work where contamination must be minimal. ≥99.99% metals basis
    Out of Stock Item #: B282351
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    Technical Identifiers
  8. Niobium chloride
    CAS: 10026-12-7 EC Number: 233-059-8 Formula: NbCl5 Molecular Weight: 270.17
    In Stock Item #: N106720
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    Technical Identifiers
    IUPAC Name
    pentachloroniobium
    SMILES
    Cl[Nb](Cl)(Cl)(Cl)Cl
    InChIKey
    YHBDIEWMOMLKOO-UHFFFAOYSA-I
    InChI
    1S/5ClH.Nb/h5*1H;/q;;;;;+5/p-5
    Synonyms
    Niobium Pentachloride | Pentachloroniobium | Niobium(V) Chloride
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R&D Use Only Products supplied for research and development use

Frequently Asked Questions

How do I choose between CVD and ALD precursors?
CVD precursors require thermal stability across deposition temperature range and clean decomposition. ALD precursors need self-limiting surface reactivity, volatility at low temperatures, and orthogonal reactivity with the co-reactant.
What specifications matter most for thin film precursors?
Volatility (vapor pressure curve), thermal stability, reactivity with substrate or co-reactant, byproduct cleanliness, purity (typically ≥99.9% for semiconductor work), and metal contamination levels.
Are precursors available in semiconductor purity grades?
Yes. We offer research-grade precursors and can support semiconductor-grade specifications for select compounds. Contact us for specific purity, metal contamination, and packaging requirements.
How should air- or moisture-sensitive precursors be handled?
Most CVD and ALD precursors require strict inert atmosphere handling (glovebox or Schlenk line). Packaging options include septum-sealed bottles, double-needle transfer adapters, and stainless steel cylinders for production scale.

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