Determine the necessary mass, volume, or concentration for preparing a solution.
≥98%(GC) for sensitive chromatographic and analytical workflows requiring minimal baseline interference.
Room temperature Ships Normal Check lot-specific COA for exact specifications.
SDS, COA, datasheet, and spec sheet available for download. Lot-specific COA accessible via lot number lookup.
Cited in 2 peer-reviewed publications across chromatography, organic synthesis, and cross-coupling reactions.
| Pubchem Sid | 504766790 |
|---|---|
| Pubchem Sid Url | https://pubchem.ncbi.nlm.nih.gov/substance/504766790 |
| Canonical Smiles | CC(=C)C(=O)OC12CC3CC(C1)CC(C3)(C2)O |
| IUPAC Name | (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate |
| InChIKey | OOIBFPKQHULHSQ-UHFFFAOYSA-N |
| INCHI | 1S/C14H20O3/c1-9(2)12(15)17-14-6-10-3-11(7-14)5-13(16,4-10)8-14/h10-11,16H,1,3-8H2,2H3 |
| Isomeric SMILES | CC(=C)C(=O)OC12CC3CC(C1)CC(C3)(C2)O |
| Molecular Weight | 236.31 |
| Reaxy-Rn | 11339416 |
| Reaxys-RN_link_address | https://www.reaxys.com/reaxys/secured/hopinto.do?context=S&query=IDE.XRN=11339416&ln= |
Comprehensive hazard, handling, storage, and regulatory compliance document.
Download SDS →Lot-specific quality data. Enter your lot number to retrieve the exact COA.
Look up COA →Full quality attributes and acceptance criteria for this grade.
View spec sheet →Taxonomy Tree
| Kingdom | Organic compounds |
|---|---|
| Superclass | Organic oxygen compounds |
| Class | Organooxygen compounds |
| Subclass | Alcohols and polyols |
| Intermediate Tree Nodes | Not available |
| Direct Parent | Tertiary alcohols |
| Alternative Parents | Enoate esters Cyclic alcohols and derivatives Monocarboxylic acids and derivatives Organic oxides Hydrocarbon derivatives Carbonyl compounds |
| Molecular Framework | Aliphatic homopolycyclic compounds |
| Substituents | Alpha,beta-unsaturated carboxylic ester - Enoate ester - Tertiary alcohol - Cyclic alcohol - Carboxylic acid ester - Monocarboxylic acid or derivatives - Carboxylic acid derivative - Organic oxide - Hydrocarbon derivative - Carbonyl group - Aliphatic homopolycyclic compound |
| Description | This compound belongs to the class of organic compounds known as tertiary alcohols. These are compounds in which a hydroxy group, -OH, is attached to a saturated carbon atom R3COH (R not H ). |
| External Descriptors | Not available |
Find and download the COA for your product by matching the lot number on the packaging.
| Lot Number | Certificate Type | Date | Item |
|---|---|---|---|
| Certificate of Analysis | May 12, 2025 | H157098 | |
| Certificate of Analysis | May 12, 2025 | H157098 | |
| Certificate of Analysis | Jul 10, 2023 | H157098 | |
| Certificate of Analysis | Jul 14, 2021 | H157098 | |
| Certificate of Analysis | Jul 14, 2021 | H157098 |
| Solubility | Soluble in methanol |
|---|---|
| Flash Point(°C) | 133 ºC |
| Boil Point(°C) | 329 ºC |
| Melt Point(°C) | 89.0to93.0℃ |
| Molecular Weight | 236.310 g/mol |
| XLogP3 | 2.300 |
| Hydrogen Bond Donor Count | 1 |
| Hydrogen Bond Acceptor Count | 3 |
| Rotatable Bond Count | 3 |
| Exact Mass | 236.141 Da |
| Monoisotopic Mass | 236.141 Da |
| Topological Polar Surface Area | 46.500 Ų |
| Heavy Atom Count | 17 |
| Formal Charge | 0 |
| Complexity | 371.000 |
| Isotope Atom Count | 0 |
| Defined Atom Stereocenter Count | 0 |
| Undefined Atom Stereocenter Count | 2 |
| Defined Bond Stereocenter Count | 0 |
| Undefined Bond Stereocenter Count | 0 |
| The total count of all stereochemical bonds | 0 |
| Covalently-Bonded Unit Count | 1 |
| 1. Wu Weilong, Feng Shihao, Ouyang Qin, Yang Zengzhuan, He Liu, Huang Qing. (2024) A novel polymethyl methacrylate (PMMA) with excellent optical and thermal properties-bearing hydroxyadamamtyl substituent. POLYMER BULLETIN, 81 (13): (12027-12043). [PMID:] [10.1007/s00289-024-05286-x] |
| 2. Zi-Hao Yang, Jing Zhao, Ya-Juan Cai, Xu Yang, Chuan-Zhe Zhao, Yang Liu, Yi-Bo Li, Ke-Xiao Sang, Yi-Xing Sun, Ya-Ge Wu, Nan-Jun Wei, Jing-Gang Gai. (2024) Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography. Nanoscale, 16 (24): (11651-11662). [PMID:38847557] [10.1039/D4NR00844H] |