Buffered oxide etchant (BOE) 6:1 with surfactant

Cat. No.: B487586

Synonyms

Buffered HF | BHF

Storage

Room temperature

Shipped In

Normal

Overview

Buffered oxide etchant (BOE) is a wet etchant used in microfabrication. Its primary use is in etching thin films of silicon dioxide (SiO2) or silicon nitride (Si3N4). It is a mixture of a buffering agent, such as ammonium fluoride (NH4F), and hydrofluoric acid (HF). Concentrated HF etches silicon dioxide too quickly for good process control and also peels photoresist used in lithographic patterning.Buffered oxide etchant (BOE) 6:1 with surfactant may be used in the oxide removal of AlGaN/GaN-based high electron mobility transistors for gate photolithography. It may also be used in a buffer oxide etchant method for the fabrication of micro biochip.

Attention：Prevent contact with glass.

Specifications

Synonyms

Buffered HF | BHF

Storage

Room temperature

Shipped In

Normal