Electronic materials for microelectronics, optoelectronics, and device research. Browse materials and precursors used in thin films, lithography, and fabrication workflows, supported by property and handling information.
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- 2-chloro-9,9-dimethyl-9H-fluoreneCAS: 382602-31-5 Formula: C15H13Cl Molecular Weight: 228.71◐ .Made to order · 8–12 wks Item #: C1238454View ProductPricing & Pack Sizes
Technical Identifiers
- IUPAC Name
- 2-chloro-9,9-dimethylfluorene
- SMILES
- CC1(C2=CC=CC=C2C3=C1C=C(C=C3)Cl)C
- InChIKey
- ANDIDBWHCQXRAM-UHFFFAOYSA-N
- InChI
- 1S/C15H13Cl/c1-15(2)13-6-4-3-5-11(13)12-8-7-10(16)9-14(12)15/h3-9H,1-2H3
- Positive PR DeveloperCMOS grade ? CMOS grade — ultra-pure quality for CMOS semiconductor manufacturing. Use where the strictest metal/particle limits protect device yield.◐ .Made to order · 8–12 wks Item #: P1523723View ProductPricing & Pack Sizes
Technical Identifiers
- Positive PR DeveloperMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: P1523725View ProductPricing & Pack Sizes
Technical Identifiers
- Negative PR DeveloperCMOS grade ? CMOS grade — ultra-pure quality for CMOS semiconductor manufacturing. Use where the strictest metal/particle limits protect device yield.◐ .Made to order · 8–12 wks Item #: N1523728View ProductPricing & Pack Sizes
Technical Identifiers
- Negative PR DeveloperMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: N1523730View ProductPricing & Pack Sizes
Technical Identifiers
- Negative PR StripperCMOS grade ? CMOS grade — ultra-pure quality for CMOS semiconductor manufacturing. Use where the strictest metal/particle limits protect device yield.◐ .Made to order · 8–12 wks Item #: N1523734View ProductPricing & Pack Sizes
Technical Identifiers
- Negative PR StripperMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: N1523736View ProductPricing & Pack Sizes
Technical Identifiers
- Positive Fhotoresist ThinnerCMOS grade ? CMOS grade — ultra-pure quality for CMOS semiconductor manufacturing. Use where the strictest metal/particle limits protect device yield.◐ .Made to order · 8–12 wks Item #: P1523738View ProductPricing & Pack Sizes
Technical Identifiers
- Positive Fhotoresist ThinnerMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: P1523740View ProductPricing & Pack Sizes
Technical Identifiers
- Wafer CleanerCMOS grade ? CMOS grade — ultra-pure quality for CMOS semiconductor manufacturing. Use where the strictest metal/particle limits protect device yield.◐ .Made to order · 8–12 wks Item #: W1523742View ProductPricing & Pack Sizes
Technical Identifiers
- Wafer CleanerMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: W1523744View ProductPricing & Pack Sizes
Technical Identifiers
- Positive PR StripperMOS grade ? MOS grade — high purity for metal-oxide-semiconductor processing. Use in MOS device fabrication sensitive to mobile-ion contamination.◐ .Made to order · 8–12 wks Item #: P1523746View ProductPricing & Pack Sizes
Technical Identifiers
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